SMAL IMaging case studies

See how SMAL can help you to see more.

SemiconductorGraphene

Microprocessor

Optical Failure Analysis and Design Inspection

SMAL is the perfect technique for rapid sub-diffraction limit imaging of features on a microprocessor during the design process, or for failure analysis. SMAL gives a 4-6x increase in magnification and resolution and increases the depth of field to 2 microns.







On the left is the sample area imaged using a standard bright-field oil immersed system.
On the right is the same area imaged with SMAL.

Standard Bright-field Oil Immersed 100x vs SMAL Water Immersed
100X SMAL
Integrated Microprocessor
100X
SMAL
100X
SMAL
100X
SMAL

Achieving 50 nm resolution

Optical Failure Analysis and Design Inspection

Below on the left is smartphone processor imaged using SMAL. You can see the small cigar shaped features (circled) which have a gap of 50 nm between them.
As you can see, SMAL is able to resolve these lateral gaps of 50nm across (measured to the right with the SEM image).




SMAL

Increased focal depth

Below is another smartphone processor imaged using SMAL. You can see that the optical focal depth of 2 micronsprovides more information about the sample imaged than conventional optical microscopy. Unlike an SEM you can see multiple layers of the sample rapidly, and in full colour.




Graphene on cu foil

Standard Bright-field Oil Immersed 100x vs SMALWater Immersed
and SMAL Water Immersed

Images focusing on the edges of the graphene flakes, grown on a cu foil substrate.

100X
SMAL
SMAL
SMAL
SMAL
100X

Graphene on cu foil

Standard Bright-field Oil Immersed 100x vs SMALWater Immersed
and SMAL Water Immersed

Images focusing on the edges of the graphene flakes, grown on a cu foil substrate.

Don't see your application area?

We have a hard-working team of application specialists who are passionate about solving your imaging problems.

Contact Us